PRODUCTSProduct Information

Mask/Reticle Handling System

RSR160

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Product Features

RSR160 clamps the reticle edge in a minimum range to transfer the reticle without settling particles, and is available for the next-generation EUV mask.

  • Various carries can be handled by mounting RORZE POD opener.
  • Available for handling of pellicle-coated reticles(by changing the robot hand).
  • Settling particle is avoided using the air flow control based on the air flow analysis.

Main Specifications of the Product

Number of ports
3
Handling object
Photomask, EUV mask 6inches x 6inches (152±0.4mm, Thickness: 6.35mm±0.1mm)
Carrier
RSP-200, RSP-150, EUV POD
Power voltage
Single-phase 200V AC ±10%, 50/60Hz ±5%
Current consumption
4kVA (20A/200 V AC) Including FFU
Vacuum (source pressure)
Vacuum (flow rate)
Positive pressure (source pressure)
0.6MPa to 0.7MPa
Positive pressure (flow rate)
10L/min
N2 gas (source pressure)
N2 gas (flow rate)
Interlock

Product Dimensions (Standard Specifications)

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Option

  • Reticle turntable
  • Reticle flipper
  • Reticle non-contact alignment
  • Reticle QR code reader

Materials

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