PRODUCTSProduct Information
Wafer Handling System：Stocker
N2-BWS
Product Features
The area for storing wafers (POD having the purge function) is provided for the wafer sorter. Test wafers and process wafers are contained inside the POD where is kept at low humidity and low oxygen to minimize the change of processed film of wafers.
- Capability of storage up to 800, 1600, or 3200 wafers.
- Low nitrogen flow rate, low oxygen, low humidity, and high level of cleanliness.
- Automatic teaching is possible.
- The shutter mechanism which opens/closes only the front of the wafer pod minimizes the opening for accessing.
Main Specifications of the Product
- Type
- BWS800 RI76172
- Handling object
- 300mm wafer: dia. 300±0.2mm, Thickness: 775μm
- Carrier
- 25-slot 300mm FOUP (SEMI E47.1) 25-slot 300mm FOSB (SEMI M31)
- Power voltage
- Three-phase 208V AC ±10%, 50/60Hz ±5%
- Current consumption
- 10kVA (30A/200V AC) including FFU
- Vacuum (source pressure)
- -80kPa to -90kPa
- Vacuum (flow rate)
- 60L/min
- Positive pressure (source pressure)
- 0.6MPa to 0.7MPa
- Positive pressure (flow rate)
- 30L/min
- N2 (source pressure)
- 0.4MPa to 0.5MPa
- N2 (flow rate)
- 300L/min
- Type
- BWS1600 RI76192
- Handling object
- 300mm wafer: dia. 300±0.2mm, Thickness: 775μm
- Carrier
- 25-slot 300mm FOUP (SEMI E47.1) 25-slot 300mm FOSB (SEMI M31)
- Power voltage
- Three-phase 208V AC ±10%, 50/60Hz ±5%
- Current consumption
- 10kVA (30A/200V AC) including FFU
- Vacuum (source pressure)
- -80kPa to -90kPa
- Vacuum (flow rate)
- 60L/min
- Positive pressure (source pressure)
- 0.6MPa to 0.7MPa
- Positive pressure (flow rate)
- 30L/min
- N2 (source pressure)
- 0.4MPa to 0.5MPa
- N2 (flow rate)
- 600L/min
- Type
- BWS3200 RSC2E2
- Handling object
- 300mm wafer: dia. 300±0.2mm, Thickness: 775μm
- Carrier
- 25-slot 300mm FOUP (SEMI E47.1) 25-slot 300mm FOSB (SEMI M31)
- Power voltage
- Three-phase 208V AC ±10%, 50/60Hz ±5%
- Current consumption
- 25kVA (75A/200V AC) including FFU
- Vacuum (source pressure)
- -80kPa to -90kPa
- Vacuum (flow rate)
- 60L/min
- Positive pressure (source pressure)
- 0.6MPa to 0.7MPa
- Positive pressure (flow rate)
- 40L/min
- N2 (source pressure)
- 0.4MPa to 0.5MPa
- N2 (flow rate)
- 1200L/min
Option
- Chemical filter
- Bar code reader/RF-ID
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